Skip to main content

Influence of the substrate temperature on the Curie temperature and charge carrier density of epitaxial Gd-doped EuO films

Cornell Affiliated Author(s)

Author

T. Mairoser
A. Schmehl
A. Melville
T. Heeg
W. Zander
J. Schubert
D.E. Shai
E.J. Monkman
K.M. Shen
T.Z. Regier
D.G. Schlom
J. Mannhart

Abstract

Rare earth doping is a standard, yet experimentally poorly understood method to increase the Curie temperature (TC) of the ferromagnetic semiconductor EuO. Here, we report on the charge carrier density (n) and the TC of commonly used 4.2 at. % Gd-doped EuO films grown by molecular-beam epitaxy on (110) oriented YAlO3 substrates at various substrate temperatures (Tsub). Increasing Tsub leads to a decrease in n and TC. For high substrate temperatures the Gd-doping is rendered completely inactive: n and TC drop to the values of undoped EuO. © 2011 American Institute of Physics.

Date Published

Journal

Applied Physics Letters

Volume

98

Issue

10

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-79952635846&doi=10.1063%2f1.3563708&partnerID=40&md5=d166c4482e66b18bfca94baa0ce1bae8

DOI

10.1063/1.3563708

Group (Lab)

Kyle Shen Group

Funding Source

DMR-0820404
FA9550-10-1-0123
TRR 80

Download citation