Influence of the substrate temperature on the Curie temperature and charge carrier density of epitaxial Gd-doped EuO films
Abstract
Rare earth doping is a standard, yet experimentally poorly understood method to increase the Curie temperature (TC) of the ferromagnetic semiconductor EuO. Here, we report on the charge carrier density (n) and the TC of commonly used 4.2 at. % Gd-doped EuO films grown by molecular-beam epitaxy on (110) oriented YAlO3 substrates at various substrate temperatures (Tsub). Increasing Tsub leads to a decrease in n and TC. For high substrate temperatures the Gd-doping is rendered completely inactive: n and TC drop to the values of undoped EuO. © 2011 American Institute of Physics.
Date Published
Journal
Applied Physics Letters
Volume
98
Issue
10
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-79952635846&doi=10.1063%2f1.3563708&partnerID=40&md5=d166c4482e66b18bfca94baa0ce1bae8
DOI
10.1063/1.3563708
Research Area
Group (Lab)
Kyle Shen Group
Funding Source
DMR-0820404
FA9550-10-1-0123
TRR 80