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Surface atomic structure of epitaxial LaNiO3 thin films studied by in situ LEED- I(V)

Cornell Affiliated Author(s)

Author

J.P. Ruf
P.D.C. King
V.B. Nascimento
D.G. Schlom
K.M. Shen

Abstract

We report in situ low-energy electron diffraction intensity versus voltage [LEED-I(V)] studies of the surface atomic structure of epitaxially grown (001)pc-oriented (pc=pseudocubic) thin films of the correlated 3d transition-metal oxide LaNiO3. Our analysis indicates the presence of large out-of-plane bucklings of the topmost LaO layers but only minor bucklings of the topmost NiO2 layers, in close agreement with earlier surface x-ray diffraction data. In view of materials design approaches that have suggested using atomic-scale polar structural distortions to produce designer electronic structures in artificial nickelate heterostructures, we propose that the broken inversion symmetry inherent to the surface of rare-earth nickelate thin films offers a similar opportunity to study the coupling between atomic structure and electronic properties in this family of materials. © 2017 American Physical Society.

Date Published

Journal

Physical Review B

Volume

95

Issue

11

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85015864690&doi=10.1103%2fPhysRevB.95.115418&partnerID=40&md5=a9365a47d85c3d3189ccedf254917a29

DOI

10.1103/PhysRevB.95.115418

Group (Lab)

Kyle Shen Group

Funding Source

APQ-01961-14
DMR-1120296
DGE-0903653
N00014-12-1-0791

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