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Approaching intrinsic performance in ultra-thin silicon nitride drum resonators

Cornell Affiliated Author(s)

Author

V.P. Adiga
B. Ilic
R.A. Barton
I. Wilson-Rae
H.G. Craighead
J.M. Parpia

Abstract

We have fabricated circular silicon nitride drums of varying diameter (20 μm to 1 mm) and thickness (15 nm-75 nm) using electron beam lithography and measured the dissipation (Q -1) of these amorphous silicon nitride resonators using optical interferometric detection. We observe that the dissipation is strongly dependent on mode type for relatively large, thick membranes as predicted by the current models of dissipation due to clamping loss. However, this dependence is drastically reduced for smaller or thinner resonators, with thinner resonators showing higher quality factors, for low order modes. Highest quality factors that can be reached for these thin resonators seems be limited by an intrinsic mechanism and scales linearly with the diameter of the membrane. Our results are promising for mass sensing and optomechanical applications where low mass and high Qs are desirable. © 2012 American Institute of Physics.

Date Published

Journal

Journal of Applied Physics

Volume

112

Issue

6

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84867050681&doi=10.1063%2f1.4754576&partnerID=40&md5=38eec4e0f790dcf8c1db8f1039f925be

DOI

10.1063/1.4754576

Group (Lab)

Jeevak Parpia Group

Funding Source

DMR 1120296
DMR-0908634
ECCS-1001742
WI-3859/1-1

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