Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique
Abstract
We fabricated 8-in. Si nanocone (NC) arrays using a nanoimprint technique and investigated their optical characteristics. The NC arrays exhibited remarkable antireflection effects; the optical reflectance was less than 10% in the visible wavelength range. The photoluminescence intensity of the NC arrays was an order of magnitude larger than that of a planar wafer. Optical simulations and analyses suggested that the Mie resonance reduced effective refractive index, and multiple scattering in the NCs enabled the drastic decrease in reflection. PACS: 88.40.H-; 88.40.jp; 81.07.Gf © 2015, Kim et al.; licensee Springer.
Date Published
Journal
Nanoscale Research Letters
Volume
10
Issue
1
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84928658503&doi=10.1186%2fs11671-015-0865-8&partnerID=40&md5=7137358238562495d8fa56670a7d5683
DOI
10.1186/s11671-015-0865-8
Research Area
Group (Lab)
Funding Source
20123010010160