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Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique

Cornell Affiliated Author(s)

Author

Eun-Ah Kim
Y. Cho
K.-T. Park
J.-H. Choi
S.-H. Lim
Y.-H. Cho
Y.-H. Nam
J.-H. Lee
D.-W. Kim

Abstract

We fabricated 8-in. Si nanocone (NC) arrays using a nanoimprint technique and investigated their optical characteristics. The NC arrays exhibited remarkable antireflection effects; the optical reflectance was less than 10% in the visible wavelength range. The photoluminescence intensity of the NC arrays was an order of magnitude larger than that of a planar wafer. Optical simulations and analyses suggested that the Mie resonance reduced effective refractive index, and multiple scattering in the NCs enabled the drastic decrease in reflection. PACS: 88.40.H-; 88.40.jp; 81.07.Gf © 2015, Kim et al.; licensee Springer.

Date Published

Journal

Nanoscale Research Letters

Volume

10

Issue

1

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84928658503&doi=10.1186%2fs11671-015-0865-8&partnerID=40&md5=7137358238562495d8fa56670a7d5683

DOI

10.1186/s11671-015-0865-8

Group (Lab)

Funding Source

20123010010160

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