Ferroelectric properties of ion-irradiated bismuth ferrite layers grown via molecular-beam epitaxy
Abstract
We systematically investigate the role of defects, introduced by varying synthesis conditions and by carrying out ion irradiation treatments, on the structural and ferroelectric properties of commensurately strained bismuth ferrite BixFe2-xO3 layers grown on SrRuO3-coated DyScO3(110)o substrates using adsorption-controlled ozone molecular-beam epitaxy. Our findings highlight ion irradiation as an effective approach for reducing through-layer electrical leakage, a necessary condition for the development of reliable ferroelectrics-based electronics. © 2019 Author(s).
Date Published
Journal
AIP Publishing
Volume
7
Issue
11
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-85074521450&doi=10.1063%2f1.5125809&partnerID=40&md5=69510f72a084808095abf4fd9b66ee5e
DOI
10.1063/1.5125809
Research Area
Group (Lab)
Funding Source
1708615
1719875
1740286
SRC